激光束质量实时测量技术

提出一种新型光束质量实时测量技术, 该技术主要基于由平板反射镜组成的多平面成像系统, 一次性将激光束腰附近2倍瑞利距离内的多个光斑成像在同一个平面上, 用CCD相机获取这些光斑的光强分布图样。通过图像处理获知接收到的光斑的光强分布。采用远场发散角、焦点尺寸、桶中功率比和M2因子四种光束质量评价标准对激光光束质量进行评价。利用该方法实时测量了高能钕玻璃双板条激光器的输出光束。

靶镜光学质量检测技术的研究

提出了一种利用扫描型哈特曼检测装置检验靶镜光学质量的技术.该装置对传统哈特曼检验装置的光阑进行了改进,通过扫描型哈特曼光阑的旋转扫描,可对被检靶镜全口径范围内连续采样.利用该扫描型哈特曼检测装置对一块口径为φ270 mm的非球面靶镜的能量集中度和波像差进行了检验,其结果与激光数字波面干涉仪的测量结果相吻合,其中能量集中度的相对测量误差为7.7%,波像差的相对测量误差为10.2%,验证了该检测技术的有效性.

Aberration measurement of projection optics in lithographic tools based on two-beam interference theory

The degradation of image quality caused by aberrations of projection optics in lithographic tools is a serious problem in optical lithography. We propose what we believe to be a novel technique for measuring aberrations of projection optics based on two-beam interference theory. By utilizing the partial coherent imaging theory, a novel model that accurately characterizes the relative image displacement of a fine grating pattern to a large pattern induced by aberrations is derived. Both even and odd aberrations are extracted independently from the relative image displacements of the printed patterns by two-beam interference imaging of the zeroth and positive first orders. The simulation results show that by using this technique we can measure the aberrations present in the lithographic tool with higher accuracy. (c) 2006 Optical Society of America.

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask

As a critical dimension shrinks, the degradation in image quality caused by wavefront aberrations of projection optics in lithographic tools becomes a serious problem. It is necessary to establish a technique for a fast and accurate in situ aberration measurement. We introduce what we believe to be a novel technique for characterizing the aberrations of projection optics by using an alternating phase-shifting mask. The even aberrations, such as spherical aberration and astigmatism, and the odd aberrations, such as coma, are extracted from focus shifts and image displacements of the phase-shifted pattern, respectively. The focus shifts and the image displacements are measured by a transmission image sensor. The simulation results show that, compared with the accuracy of the previous straightforward measurement technique, the accuracy of the coma measurement increases by more than 30% and the accuracy of the spherical-aberration measurement increases by approximately 20%. (c) 2006 Optical Society of America.

Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools

As the feature size decreases, degradation of image quality caused by wavefront aberrations of projection optics in lithographic tools has become a serious problem in the low-k1 process. We propose a novel measurement technique for in situ characterizing aberrations of projection optics in lithographic tools. Considering the impact of the partial coherence illumination, we introduce a novel algorithm that accurately describes the pattern displacement and focus shift induced by aberrations. Employing the algorithm, the measurement condition is extended from three-beam interference to two-, three-, and hybrid-beam interferences. The experiments are performed to measure the aberrations of projection optics in an ArF scanner. (C) 2006 Optical Society of America.

Coma measurement using a PSM and transmission image sensor

As feature size decreases, especially with the use of resolution enhancement technique, requirements for the coma aberrations in the projection lenses of the lithographic tools have become extremely severe. So, fast and accurate in situ measurement of coma is necessary. In the present paper, we present a new method for characterizing the coma aberrations in the projection lens using a phase-shifting mask and a transmission image sensor. By measuring the image positions at multiple NA and partial coherence settings, we are able to extract the coma aberration. The simulation results show that the accuracy of coma measurement increases approximately 20% compared to the previous straightforward measurement technique. (c) 2005 Elsevier GmbH. All rights reserved.

Measurement of 5-day biochemical oxygen demand without sample dilution or bacterial and nutrient enhancement

A direct method for measuring the 5-day biochemical oxygen demand (BODS) of aquaculture samples that does not require sample dilution or bacterial and nutrient enrichment was evaluated. The regression coefficient (R-2) between the direct method and the standard method for the analyses of 32 samples from catfish ponds was 0.996. The slope of the regression line did not differ from 1.0 or the Y-intercept from 0.0 at P = 0.05. Thus, there was almost perfect agreement between the two methods. The control limits (three standard deviations of the mean) for a standard solution containing 15 mg/L each of glutamic acid and glucose were 17.4 and 20.4 mg/L. The precision of the two methods, based on eight replicate analyses of four pond water samples did not differ at P = 0.05. (c) 2005 Elsevier B.V All rights reserved.

Back-to-back Schottky diode adopted for the measurement of GaN films and its Schottky contacts

A new measurement method for GaN films and their Schottky contacts is reported in this paper. Instead of the fabrication of Ohmic contacts, this measurement is based on a special back-to-back Schottky diode that has a rectifying character. A mathematical model indicates that the electronic parameters of the materials can be deduced from the device's I-V data. In the experiment of an unintentionally doped n-type GaN layer with a residual carrier density 7 x 10(16) cm(-3), the analysis by the new method gives the layer's sheet resistance rho(s) = 497 Omega, the electron mobility mu(n) =, 613 cm(2) V-1 s(-1) and the ideality factor of the Ni/Au-GaN Schottky contacts n = 2.5, which are close to the data obtained by the traditional measurements: rho(s) = 505 Omega, mu(n) = 585 cm(2) V-1 s(-1) and n = 3.0. The method reported can be adopted not only for GaN films but also for other semiconductor materials, especially in the cases where Ohmic contacts of high quality are hard to make or their fabricating process affects the film's character.

Method for measurement of lattice parameter of cubic GaN layers on GaAs (001)

An extended technique derived from triple-axis diffraction setup was proposed to measure lattice parameters of cubic GaN(c-GaN) films. The fully relaxed lattice parameters of c-GaN are determined to be 4.5036+0.0004 Angstrom, which is closer to the values of a hypothetical perfect crystal. The speculated zero setting correction (Deltatheta) is very slight and within the range of the accuracy of measurement. Additionally, we applied this method to analyze strain of four different kinds of c-GaN samples. It is found that in-plane strain caused by large lattice mismatch and thermal expansion coefficients mismatch directly influence the epilayer growth at high temperatures, indicating that the relaxation of tensile strain after thermal annealing helps to improve the crystalline quality of c-GaN films and optical properties. (C) 2003 Elsevier Science B.V. All rights reserved.

Effective method for evaluation of semiconductor laser quality

The measurements of one hundred 1.3 mu m planar buried crescent (PBC) structure InGaAsP/InP lasers demonstrate that parameters given by the electrical derivative of varied temperature and the variation of the parameters with temperature can be used to appraise the quality and reliability of semiconductor lasers effectual. By measurement of electrical derivative curves one can evaluate the quality of epitaxial wafer and chip, find the problems in the material and the technology, offer the useful information on increasing the quality and improving the technology of devices. (C) 2000 Elsevier Science Ltd. All rights reserved.

Impacts of the embedded windings to the field quality of dipole

Cooler Storage Ring (CSR) of Heavy Ion Research Facility in Lanzhou (HIRFL) consists of a main ring (CSRm) and an experimental ring (CSRe). Two particular C-type dipoles with embedded windings are used in the injection beam line of CSRm. They also act as the prototype dipoles of CSRe. The windings are designed to improve the field quality by their trimming current. The current impacts on field homogeneity and multipole components are investigated by a hall sensor and a long coil, respectively. The experiment shows that a field homogeneity of +/- 1.0 x 10(-3) can be reached by adjusting the trimming currents, though the multipole components change correspondingly. In our case, the quadrupole component is decreased to a low level with the octupole, decapole and 12-pole ones increased slightly when the trimming current is optimized.

High sensitivity beam phase measurement system for isochronous cyclotron

The beam phase measurement system in the HIRFL is introduced. Based on the double-balanced mixer principle using rf-signal mixing and filtering techniques, a stable and sensitive phase measurement system has been developed. The phase history of the ion beam is detected by using a set of capacitive pick-up probes installed in the cyclotron. The phase information of the measurement is necessary for tuning to obtain a optimized isochronous magnetic field which induces to maximize the beam intensity and to optimize the beam quality. The result of the phase measurement is reliable and the accurancy reaches +/- 0.5 degrees.